ALLRESIST German brand - product selection _ product quotation _ technical support _ after-sales service

brand introduction
ALLRESIST GmbH returned to the roots of the 1960s. At the "Fotochemische Werke Berlin" (ORWO), the research project initiated the development of copy coatings. Already in 1965, the first working photoresist was based on the production of cinnamic acid for transistors. In the era, development efforts and research departments were expanded to 100 employees. The mass production of new production facilities was established in 1987, and the production and improved versions of this facility are still resisted by ALLRESIST today.
      After trying to resist production privatization in 1992, it failed and the department was closed. The only possible way to save very resistant technology is to set up a new big, small, and highly productive company - ALLRESIST GmbH.
category
Light Emitting Diodes Micro Flow Channels and Biochips Photonic Devices Micro Electro Mechanical Systems Solar Photovoltaics Industrial Analog Semiconductors Optoelectronic Devices
Product category

Electron beam photoresist, photoresist, ultraviolet photoresist, electron beam resist, photoresist